The program of the conference is built around invited, contributed talks and poster presentations.
Below, the updated program of the 2019 ELENA Conference.
Wednesday, September 4th, 2019 |
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08:00 |
Badge pick-up and breakfast |
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ELENA Project introduction |
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09:00 |
Welcome and opening Remarks | |
09:15 |
Oddur Ingolfsson, Professor, Department of Chemistry, Science Institute University of Iceland |
ELENA: a Marie Skłodowska-Curie Innovative Training Network |
Keynote I [device scaling and EUVL] | ||
09:30 |
Nadine Collaert, Program Director at IMEC, Belgium | CMOS scaling is dead...long live scaling! |
10:10 |
Sander Wuister, Sr. Manager at ASML Research, the Netherlands |
EUV lithography performance for manufacturing: |
10:50 |
Coffee break |
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Invited I [fundamentals on electron-induced chemistry] | ||
11:10 |
Juraj Fedor, Deputy Head of Dynamics of Molecules and Clusters dept., J. Heyrovsky Institute of Physical Chemistry, Czech Academy of Sciences, Prague, Czech Republic |
Insight into electron-induced chemistry in FEBID and in EUVL from experiments with clusters |
11:40 | Takahiro Kozawa, Professor at the Institute of Scientific and Industrial Research, Osaka University, Japan |
Radiation chemistry in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography |
12:10 |
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13:25 | Frank Ogletree, Staff Scientist at Molecular Foundry, Berkeley Lab, Berkeley, CA USA |
Contrasting electron-induced reactions in Extreme UV and Electron Beam Lithography: Insights from experiment and theory |
13:55 |
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Interaction of Low Energy Electrons with PMMA: determination of fundamental parameters and role of plasmon excitation/decay |
Student session I [e-beam and Metal Oxide Framework] |
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14:25 | R.Cartaya, K. Ahlenhoff, M. Rohdenburg, P. Swiderek University of Bremen, Faculty 2 (Chemistry/Biology), Institute of Applied Physical Chemistry, Bremen, Germany |
Electron-Beam induced solubility switching in Surface Anchored Metal-Organic Frameworks |
14:40 | Min Tu, Rob Ameloot cMACS-Centre for Membrane Separations, Adsorption, Catalysis and Spectroscopy for Sustainable Solutions, KU Leuven, Leuven, Belgium |
Patterning nanoporous metal-organic framework thin films in nanoscale via e-beam lithography |
Student session II [FEBIP 3D] | ||
14:55 | A. Mahgoub, C.W. Hagen, Department of Imaging Physics, Delft University of Technology, Delft, The Netherlands |
Towards Efficient Direct Write of 3D Structures Using Electron Beam Induced Deposition |
15:10 | D. Markó a+, G. Goupilb, P. Le Galb, J. Jirušea aTESCAN Brno s.r.o., Brno, Czech Republic, bOrsay Physics, TESCAN Orsay, Fuveau, France |
Novel Results for 3D Nanostructures deposited by FEBID |
15:25 |
Coffee break |
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Student session III [FEBIP modeling] | ||
15:45 | Abid Ali and Hannes Jónsson Science Institute, University of Iceland, Reykjavik, Iceland |
Modelling of metal nanostructure growth |
Lectures I [EUV] | ||
16:00 | T. Watanabe and T. Harada, Hyogo University, Japan [invited] |
Fundamental Studies of EUV Resist at the NewSUBARU Synchrotron Light Source |
16:30 | Peter M. Kraus, Advanced Research Center for Nanolithography, The Netherlands |
Unraveling the kinetics of secondary-electron induced reactions by extreme ultraviolet spectroscopy with high-harmonic sources |
16:50 | John Petersen and Paul van der Heide, imec, Leuven, Belgium |
Introduction to imec’s AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography |
17:10 | Closing remarks of 1st day and poster session opening |
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Poster session | ||
17:15 18:45 |
Y. Vos, C.W. Hagen, J.P. Hoogenboom Imaging Physics, TU Delft, Delft, the Netherlands |
Visualizing few eV electron matter interactions |
J. H. Bredehöft, F. Schmidt, E. Böhler, T. Borrmann, P. Swiderek University of Bremen, Institute for Applied and Physical Chemistry, Bremen, Germany |
CO: Volatile ligand or feedstock for impurities? | |
L. Wu, S. Castellanos Advanced Research Center for Nanolithography, Amsterdam, The Netherlands |
Fluorinated Metal oxo Cluster For EUV Patterning | |
F. Schmidt, J. H. Bredehöft, P. Swiderek University of Bremen, Institute for Applied and Physical Chemistry, Bremen, Germany |
Electron-Induced Reactions of Olefins with Different Process Gases | |
a S. W. Cendron, a G. K. Belmonte, b G. P. Reddy, c M. G. Moinuddin, c J. Peter, a C. A. S. Moura, a G. Lando, b S. K. Sharma, c K. E. Gonsalves, a D. E. Weibel a Institute of Chemistry, Universidade Federal do Rio Grande do Sul-UFRGS, Porto Alegre, RS, Brazil. b School of Basic Sciences, Indian Institute of Technology Mandi, Mandi, Himachal Pradesh, India. c School of Computing and Electrical Engineering, Indian Institute of Technology Mandi, Himachal Pradesh, India. |
Photo-dynamic Study of Tin Based Hybrid n-CAR Resist for Next Generation EUVL | |
a S. Nannarone, a N. Mahne, a A. Giglia, a K. Koshmak, a L. Pasquali, b R. Fallica, b D. De Simone a CNR-IOM, Trieste, Italy b IMEC, Leuven, Belgium |
BEAR beamline as a tool for investigation of photo-excited low energy electrons processes in soft organic materials |
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P. Martinović , M. Rohdenburg, P. Swiderek Institute for Applied and Physical Chemistry, Department 2 (Biology/Chemistry), University of Bremen, Germany |
Rational design of carboxylate precursors for deposition of pure silver by FEBID: Role of the alkyl chain | |
a+ A. Kamali, b W. Carden, c E. Bilgilisoy, d T. Gentner, b L. McElwee-White, d S. Harder, c H. Marbach, a O. Ingólfsson a Department of Chemistry and Science Institute - University of Iceland, Reykjavik, Iceland b Department of Chemistry - University of Florida, Florida, United States c Physical Chemistry II, FAU Erlangen-Nürnberg, Erlangen, Germany. d Department of Chemistry – FAU Erlangen-Nürnberg, Erlangen, Germany |
An investigation on the low energy electron-induced decomposition of potential gold (I) and (III) containing precursors for FEBID technique |
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P. Y. Shih, Ch. F. Hermanns, J. Oster and K.Edinger Carl Zeiss SMT GmbH - ZEISS Group, Rossdorf, Germany |
Optical analysis of Focused Electron Beam Induced Depositions on photo masks | |
a R. Fallica, b S, J, Rezvani, b S. Nannarone, c S. Borisov, a D. De Simone, c S. Babin, a G, Lorusso, a G. Vandenberghe a IMEC, Leuven, Belgium b CNR-IOM synchrotron beamline BEAR, Elettra, Trieste, Italy c aBeam Technologies Inc., Hayward CA, USA |
The hidden tail of low energy electrons in extreme ultraviolet lithography | |
a M. Rohdenburg, a P. Martinović , a H. Boeckers, b C.R. Brewer, b L. McElwee-White, a P. Swiderek a Institute for Applied and Physical Chemistry, Department 2 (Biology/Chemistry), University of Bremen, Germany b Department of Chemistry, University of Florida, Gainesville, Florida, U.S. |
Exploiting the electron-induced chemistry of NH3 for FEBIP: Applications as precursor ligand and purification agent |
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G. Jeevanandam, R. van Tol, Y. van Goozen, P. Kruit and C.W.Hagen Delft University of Technology, Dept. Imaging Physics, Charged Particle Optics group, Delft, The Netherlands. |
“Cleanroom” in SEM | |
a R. Tafrishi, b J. Malletroit, b C. Dablemont, b L. Amiaud, b A. Lafosse, a O. Ingólfsson a Department of Chemistry, Science institute, University of Iceland, Reykjavik, Iceland b Institut des Sciences Moléculaires d’Orsay (ISMO), CNRS, Univ Paris Sud, Université, Paris-Saclay, Orsay, France |
Low Energy Electrons in Dissociation of TFMAA as a monomer in EUVL technique: gas phase and surface study |
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H. L. Le, Y. Yang, M. Westphal, N. Biere, D. Anselmetti and A. Gölzhäuser Faculty of Physics, Bielefeld University, Germany |
Terphenylthiol carbon nanomembranes on silver substrates | |
M. G. Moinuddin1, P. G. Reddy2, Satinder K. Sharma1, S. Ghosh2, C. P. Pradeep2, and K. E. Gonsalves2 1 School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India 2 School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India |
Evaluation of Tin (Sn) Hybrid Non-Chemically Amplified Resist (n-CAR) for Advanced Nanoscale Patterning |
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M.G. Moinuddin1, Manoj Sahani1, Shivani Sharma1, M. Yogesh2, Satinder K. Sharma1, Subrata Ghosh2, Chullikkattil P. Pradeep and Kenneth E. Gonsalves2 1 School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India 2 School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India |
Enhanced photosensitivity of novel photoresist embedded with metallic nanoparticles for Next-generation lithography |
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Rudra Kumar1, M.G. Moinuddin1, Manvendra Chauhan1, Jerome Peter1, Satinder K. Sharma1 and Kenneth E. Gonsalves2 1 School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India 2 School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India |
Facile Synthesis of Nickel Metal Organic Cluster Photoresist for sub-10 nm node Lithography | |
C. Popescu a,b,f, A. McClelland a, G. O’Callaghan a,b, Y. Vesters c,d, J. Roth e, W. Theis f, A.P.G. Robinson a,b a Irresistible Materials, Birmingham, United Kingdom b School of Chemical Engineering, University of Birmingham, United Kingdom c IMEC, Leuven, Belgium d KU Leuven, Chemistry Department, Leuven, Belgim e Nano-C, Westwood, MA, USA f School of Physics and Astronomy, University of Birmingham, United Kingdom |
Multi-Trigger Resist for EUV Lithography | |
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Thursday, September 5th, 2019 |
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08:00 |
Badge pick-up and breakfast |
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09:00 | Welcome and opening Remarks |
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Keynote II [FEBIP and EUV mask repair] | ||
09:10 | Daniel Rhinow, Professor, Scientist at Carl Zeiss SMT GmbH, Germany |
Focused electron beam-induced processing and its application to photomask repair |
Invited II [fundamentals on electron-induced chemistry] | ||
09:50 | Ilya Fabrikant, Professor at Physics & Astronomy Dept., University of Nebraska-Lincoln, USA |
Electron attachment to molecules in condensed-matter and cluster environments |
10:20 | Jason Davidson Fowlkes, Staff Scientist at Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Tennessee, USA |
3D Nano-printing using Focused Electron Beam Induced Deposition |
10:50 |
Coffee break |
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11:10 | Amalio Fernández-Pacheco, EPSRC Early Career Fellow at the Materials and Condensed Matter Physics group, School of Physics & Astronomy, University of Glasgow, UK |
Synthesis of advanced nanomagnetic systems using Focused Electron Beam Induced Deposition |
11:40 | Howard Fairbrother, Professor of Chemistry at Johns Hopkins University, Baltimore, USA |
Electron and Ion Induced Surface Reactions with Organometallic Precursors |
12:10 | Anne Lafosse, Institut des Sciences Moléculaires d’Orsay (ISMO), CNRS, Univ Paris-Sud, Université Paris-Saclay, Orsay, France |
Tuning the properties of molecular organic layers at the micron-scale using low-energy electrons |
12:40 |
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Lectures II [EUV] | ||
13:55 | I. Pollentier, R. Fallica, A. Rathore, J. S. Petersen, D. De Simone, imec, Leuven, Belgium |
Measurements for understanding the EUV photoresist reactions |
14:15 | a,b I. Bespalov, a,c S. Castellanos, b J. Jobst, b,d R. M. Tromp, a,c Y. Zhang, a,c A. M. Brouwer, b S. J. van der Molen a Advanced Research Center for Nanolithography, Amsterdam, The Netherlands b Leiden University, Huygens-Kamerlingh Onnes Laboratory, Leiden, The Netherlands c University of Amsterdam, van‘t Hoff Institute for Molecular Sciences, Amsterdam, The Netherlands d IBM T.J. Watson Research Center,Yorktown Heights, New York 10598, USA |
Low-Energy electrons in Organometallic EUV resist |
14:35 | Satinder K. Sharma1 M.G. Moinuddin1, Shivani Sharma1, M. Yogesh2, Rudra Kumar1 and Kenneth E. Gonsalves2 1 School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India 2 School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India |
Advancement Towards Sub-15 nm Resists Patterning for High Volume Manufacturing of Semiconductor Industry |
10:50 |
Coffee break |
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15:15 | a L.-T. Tseng, a D. Kazazis, b P. Constantinou, c T. Stock, c N. Curson, b S. Schofield, a,d,e G. Aeppli and a Y. Ekinci a Paul Scherrer Institute, 5232 Villigen PSI, Switzerland b Dept. of Physics and Astronomy, University College London, London, UK c London Centre for Nanotech., University College London, London, UK d Laboratory for Solid State Physics, ETH Zurich, Switzerland e Institut de Physique, EPFL, Lausanne, Switzerland |
Large-area resistless patterning on hydrogen-terminated Si using EUV lithography |
Lectures III [FEBIP] | ||
15:35 | a C. R. Brewer, a J.-C. Yu, b,c R. M. Thorman, d J. Jurczyk, b D. H. Fairbrother, c O. Ingólfsson, d I. Utke, a+ L. McElwee-White a Department of Chemistry, University of Florida, Gainesville, Florida, USA b Department of Chemistry, Johns Hopkins University, Baltimore, Maryland USA c Science Institute and Department of Chemistry, University of Iceland, Reykjavík, Iceland d Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures Thun, Switzerland |
Precursors for FEBID of Ru |
15:55 | a+ I. Utke, a,b J. Jurczyk, b Cz. Kapusta a Empa – Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland b AGH University of Science and Technology Kraków, Poland |
FEBID frequency maps visualizing lateral deposit resolution and surface diffusion |
16:15 | Closing remarks of second day |
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19:00 | Dinner at "de Hoorn" | |
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Friday, September 6th, 2019 |
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08:00 |
Breakfast |
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08:30 | Welcome and opening Remarks |
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Student session IV [EUV materials] | ||
08:40 | N. Thakur, S. Castellanos, ARCNL, Amsterdam, Netherlands |
Zn-based metal resist for EUV lithography |
08:55 | Ching-Chung Huang1, Christian Gorsche2, Andreas Rohatschek3, Robert Liska2, and Jürgen Stampfl1 1 Institute of Materials Science and Technology, Wien, Austria, 2 Institute of Applied Synthetic Chemistry, Division Macromolecular Chemistry, Wien, Austria, 3 Institute of Lightweight Design and Structural Biomechanics, Wien, Austria |
Synthesis and Characterizations of Group 4 Metal Oxo Clusters for EUVL Photoresist Applications |
09:10 | N. Sadegh, F. Campi, J. Haitjema, M. van der Geest, P. Kraus, A.M. Brouwer, S. Castellanos Ortega ARCNL - Advanced Research Center for Nanolithography, The Netherlands |
Soft x-ray absorption spectroscopy of inorganic photoresists |
09:25 | A. Rathorea, I. Pollentiera, H. Singhc, R. Fallicaa, D. De Simonea, S. De Gendta,b aIMEC, Kapeldreef 75, 3001 Leuven, Belgium bKU Leuven Department of Chemistry, Celestijnenlaan 200, 3001 Leuven, Belgium cCentre for nanoscience and nanotechnology, Panjab University, 160014 Chandigarh, India |
Scission mechanism in the main chain scission type polymers for EUV lithography |
Student session V [FEBIP materials] | ||
09:40 | a C. Glessi, b,c J. Jurczyk, d A. Mahgoub, d K. Hagen, b I. Utke, a M. Tilset a Department of Chemistry - University of Oslo, Norway, b EMPA, Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland, c Faculty of Physics and Applied Computer Sciences, AGH University of Science and Technology Kraków, Poland, d Department of Imaging Physics, Delft University of Technology, The Netherlands. |
Synthesis, characterization and investigation of Gold(I) NHC complexes as FEBID precursors |
09:55 | a,b J. Jurczyk, a L. Berger, c K. Höflich, e C. Glessi, d K. Madajska, d I. Szymanska, e M. Tilset, b Cz. Kapusta, and a+ I. Utke a Empa – Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland b AGH University of Science and Technology Kraków, Poland c Helmholtz-Zentrum Berlin fur Materialien und Energie, Berlin, Germany d Nicolaus Copernicus University, Toruń, Poland e University of Oslo, Oslo, Norway |
Carboxylates as promising group of silver FEBID precursors |
10:10 |
Coffee break |
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10:30 | a E. Bilgilisoy, a C. Preischl, b R. Thorman, b D.H. Fairbrother, a H. Marbach a Physikalische Chemie II, FAU Erlangen-Nürnberg, Erlangen, Germany b Department of Chemistry, Johns Hopkins University, Baltimore, Maryland, United States. |
FEBIP on novel oxide surfaces and electron/ion induced surface reactions of Fe(CO)5 |
10:45 | a Maria Pintea, a,bNigel Mason and cPablo de Vera a School of Physical Sciences, University of Kent, Canterbury, UK b School of Physical Sciences, The Open University, Milton Keynes, UK c MBN Research Center, Frankfurt, Germany |
Complex Molecular System Dynamics in Fe(CO)5 for FEBIP Applications |
[invited] The needs from the Industry | ||
11:00 | James Blackwell, Components Research, Intel Corporation, USA |
Simplifying the Complex: Mechanism-informed design of EUV photoresists to control chemical variation in patterning |
11:25 | Ulrich Welling, Synopsys GmbH, Germany |
Material Modeling for Computational Lithography – the delicate balance of precision, predictability and computational speed |
11:50 | Ofer Adan, AMAT |
Enabling e-beam patterning control for <5nm scaling |
12:15 | Hajme Furutani, FUJIFILM Electronic Materials, Japan |
Challenges of EUV resist development for 3nm node and beyond |
12:40 |
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Lectures from the Industry | ||
13:40 | a T. Gädda, a N.D. Luong, a M. Laukkanen, a K. Karaste, a O. Kähkönen, b D. Kazazis, b Y. Ekinci, and a J. Rantala a PiBond Oy, Finland b Paul Scherrer Institute, Switzerland |
Silicon-rich EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution |
14:00 | a J. G. Santaclara, a G. Rispens, a R. Hoefnagels, a J. van Bree, b P. De Schepper a ASML, The Netherlands b Inpria Corporation, OR, USA |
Unravelling Inpria metal oxide resist for high-NA imaging |
14:20 | Best Student Oral Presentation Award |
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14:30 | Closing remarks and Adjourn |
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