The program of the conference is built around invited, contributed talks and poster presentations.

Below, the updated program of the 2019 ELENA Conference.

 

 
Wednesday, September 4th, 2019
 
   
 
08:00

 
  Badge pick-up and breakfast

  
 ELENA Project introduction


 09:00

 Welcome and opening Remarks 

 09:15  

 
 Oddur Ingolfsson, Professor, Department of Chemistry, Science Institute University of Iceland

ELENA: a Marie Skłodowska-Curie Innovative Training Network
Keynote I [device scaling and EUVL]

 

09:30

Nadine Collaert, Program Director at IMEC, Belgium CMOS scaling is dead...long live scaling!
 
10:10


 Sander Wuister
, Sr. Manager at ASML Research, the Netherlands

EUV lithography performance for manufacturing:
status and outlook

 
10:50

Coffee break
Invited I [fundamentals on electron-induced chemistry]
 
11:10

 
  Juraj Fedor, Deputy Head of Dynamics of Molecules and Clusters dept., J. Heyrovsky Institute of Physical Chemistry,
Czech Academy of Sciences, Prague, Czech Republic

Insight into electron-induced chemistry in FEBID and in EUVL from experiments with clusters
 11:40
 Takahiro Kozawa, Professor at the Institute of Scientific and Industrial Research, Osaka University, Japan

 Radiation chemistry in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
 12:10

 
Lunch

13:25
Frank Ogletree, Staff Scientist at Molecular Foundry, Berkeley Lab, Berkeley, CA USA


Contrasting electron-induced reactions in Extreme UV and Electron Beam Lithography: Insights from experiment and theory

13:55


Wolfgang Werner,
Professor at the Institute of Applied Physics, Vienna University of Technology, Austria

Interaction of Low Energy Electrons with PMMA: determination of fundamental parameters and role of plasmon excitation/decay
Student session I [e-beam and Metal Oxide Framework]
14:25
R.Cartaya, K. Ahlenhoff, M. Rohdenburg, P. Swiderek

University of Bremen, Faculty 2 (Chemistry/Biology), Institute of Applied Physical
Chemistry, Bremen, Germany

Electron-Beam induced solubility switching in Surface Anchored Metal-Organic Frameworks
14:40
Min Tu, Rob Ameloot

cMACS-Centre for Membrane Separations, Adsorption, Catalysis and Spectroscopy for Sustainable Solutions, KU Leuven, Leuven, Belgium

Patterning nanoporous metal-organic framework thin films in nanoscale via e-beam lithography
Student session II [FEBIP 3D]
14:55
A. Mahgoub, C.W. Hagen
, Department of Imaging Physics, Delft University of Technology, Delft, The Netherlands

Towards Efficient Direct Write of 3D Structures Using Electron Beam Induced Deposition
 15:10
 D. Markó a+, G. Goupilb, P. Le Galb, J. Jirušea

aTESCAN Brno s.r.o., Brno, Czech Republic, bOrsay Physics, TESCAN Orsay, Fuveau, France

 Novel Results for 3D Nanostructures deposited by FEBID
 
15:25

Coffee break
Student session III [FEBIP modeling]
15:45
 Abid Ali and Hannes Jónsson
Science Institute, University of Iceland, Reykjavik, Iceland

 Modelling of metal nanostructure growth
Lectures I [EUV]
 16:00
 T. Watanabe and T. Harada, Hyogo University, Japan [invited]

 Fundamental Studies of EUV Resist at the NewSUBARU Synchrotron Light Source
 16:30
 Peter M. Kraus, Advanced Research Center for Nanolithography, The Netherlands

 Unraveling the kinetics of secondary-electron induced reactions by extreme ultraviolet spectroscopy with high-harmonic sources
16:50
John Petersen and Paul van der Heide, imec, Leuven, Belgium

Introduction to imec’s AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
17:10
Closing remarks of 1st day and poster session opening

 Poster session 
17:15
18:45
Y. Vos, C.W. Hagen, J.P. Hoogenboom
Imaging Physics, TU Delft, Delft, the Netherlands
Visualizing few eV electron matter interactions
J. H. Bredehöft, F. Schmidt, E. Böhler, T. Borrmann, P. Swiderek
University of Bremen, Institute for Applied and Physical Chemistry, Bremen, Germany
CO: Volatile ligand or feedstock for impurities?
L. Wu, S. Castellanos
Advanced Research Center for Nanolithography, Amsterdam, The Netherlands
Fluorinated Metal oxo Cluster For EUV Patterning
F. Schmidt, J. H. Bredehöft, P. Swiderek
University of Bremen, Institute for Applied and Physical Chemistry, Bremen, Germany
Electron-Induced Reactions of Olefins with Different Process Gases
a S. W. Cendron, a G. K. Belmonte, b G. P. Reddy, c M. G. Moinuddin, c J. Peter,
a C. A. S. Moura, a G. Lando, b S. K. Sharma, c K. E. Gonsalves, a D. E. Weibel
a Institute of Chemistry, Universidade Federal do Rio Grande do Sul-UFRGS, Porto Alegre, RS, Brazil.
b School of Basic Sciences, Indian Institute of Technology Mandi, Mandi, Himachal Pradesh, India.
c School of Computing and Electrical Engineering, Indian Institute of Technology Mandi, Himachal Pradesh, India.
Photo-dynamic Study of Tin Based Hybrid n-CAR Resist for Next Generation EUVL
a S. Nannarone, a N. Mahne, a A. Giglia, a K. Koshmak, a L. Pasquali, b R. Fallica, b D. De Simone
a CNR-IOM, Trieste, Italy
b IMEC, Leuven, Belgium
BEAR beamline as a tool for investigation of photo-excited low
energy electrons processes in soft organic materials
P. Martinović , M. Rohdenburg, P. Swiderek
Institute for Applied and Physical Chemistry, Department 2 (Biology/Chemistry), University of Bremen, Germany
Rational design of carboxylate precursors for deposition of pure silver by FEBID: Role of the alkyl chain
a+ A. Kamali, b W. Carden, c E. Bilgilisoy, d T. Gentner, b L. McElwee-White, d S. Harder, c H. Marbach, a O. Ingólfsson
a Department of Chemistry and Science Institute - University of Iceland, Reykjavik, Iceland
b Department of Chemistry - University of Florida, Florida, United States
c Physical Chemistry II, FAU Erlangen-Nürnberg, Erlangen, Germany.
d Department of Chemistry – FAU Erlangen-Nürnberg, Erlangen, Germany
An investigation on the low energy electron-induced decomposition of potential gold (I) and (III)
containing precursors for FEBID technique
P. Y. Shih, Ch. F. Hermanns, J. Oster and K.Edinger
Carl Zeiss SMT GmbH - ZEISS Group, Rossdorf, Germany
Optical analysis of Focused Electron Beam Induced Depositions on photo masks
a R. Fallica, b S, J, Rezvani, b S. Nannarone, c S. Borisov, a D. De Simone, c S. Babin, a G, Lorusso, a G. Vandenberghe
a IMEC, Leuven, Belgium
b CNR-IOM synchrotron beamline BEAR, Elettra, Trieste, Italy
c aBeam Technologies Inc., Hayward CA, USA
The hidden tail of low energy electrons in extreme ultraviolet lithography
a M. Rohdenburg, a P. Martinović , a H. Boeckers, b C.R. Brewer, b L. McElwee-White, a P. Swiderek
a Institute for Applied and Physical Chemistry, Department 2 (Biology/Chemistry), University of Bremen, Germany
b Department of Chemistry, University of Florida, Gainesville, Florida, U.S.
Exploiting the electron-induced chemistry of NH3 for FEBIP: Applications as precursor
ligand and purification agent
G. Jeevanandam, R. van Tol, Y. van Goozen, P. Kruit and C.W.Hagen
Delft University of Technology, Dept. Imaging Physics, Charged Particle Optics group, Delft, The Netherlands.
“Cleanroom” in SEM
a R. Tafrishi, b J. Malletroit, b C. Dablemont, b L. Amiaud, b A. Lafosse, a O. Ingólfsson
a Department of Chemistry, Science institute, University of Iceland, Reykjavik, Iceland
b Institut des Sciences Moléculaires d’Orsay (ISMO), CNRS, Univ Paris Sud, Université, Paris-Saclay, Orsay, France
Low Energy Electrons in Dissociation of TFMAA as a monomer in EUVL technique:
gas phase and surface study
H. L. Le, Y. Yang, M. Westphal, N. Biere, D. Anselmetti and A. Gölzhäuser
Faculty of Physics, Bielefeld University, Germany
Terphenylthiol carbon nanomembranes on silver substrates
M. G. Moinuddin1, P. G. Reddy2, Satinder K. Sharma1, S. Ghosh2, C. P. Pradeep2, and K. E. Gonsalves2
1 School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India
2 School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India
Evaluation of Tin (Sn) Hybrid Non-Chemically Amplified Resist (n-CAR)
for Advanced Nanoscale Patterning
M.G. Moinuddin1, Manoj Sahani1, Shivani Sharma1, M. Yogesh2, Satinder K. Sharma1, Subrata Ghosh2,
Chullikkattil P. Pradeep and Kenneth E. Gonsalves2

1 School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India
2 School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India
Enhanced photosensitivity of novel photoresist embedded with metallic nanoparticles
for Next-generation lithography
Rudra Kumar1, M.G. Moinuddin1, Manvendra Chauhan1, Jerome Peter1, Satinder K. Sharma1 and
Kenneth E. Gonsalves2

1 School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India
2 School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India
Facile Synthesis of Nickel Metal Organic Cluster Photoresist for sub-10 nm node Lithography
C. Popescu a,b,f, A. McClelland a, G. O’Callaghan a,b, Y. Vesters c,d, J. Roth e, W. Theis f, A.P.G. Robinson a,b
a Irresistible Materials, Birmingham, United Kingdom
b School of Chemical Engineering, University of Birmingham, United Kingdom
c IMEC, Leuven, Belgium
d KU Leuven, Chemistry Department, Leuven, Belgim
e Nano-C, Westwood, MA, USA
f School of Physics and Astronomy, University of Birmingham, United Kingdom
Multi-Trigger Resist for EUV Lithography
 

 


 

 
 

 Thursday, September 5th, 2019 

 
08:00

 
  Badge pick-up and breakfast

 09:00  
Welcome and opening Remarks 

Keynote II [FEBIP and EUV mask repair]
 09:10
 Daniel Rhinow, Professor, Scientist at Carl Zeiss SMT GmbH, Germany

 Focused electron beam-induced processing and its application to photomask repair
Invited II [fundamentals on electron-induced chemistry]
  09:50  
Ilya Fabrikant, Professor at Physics & Astronomy Dept., University of Nebraska-Lincoln, USA

 Electron attachment to molecules in condensed-matter and cluster environments
10:20
Jason Davidson Fowlkes
, Staff Scientist at Center for Nanophase Materials Sciences,
Oak Ridge National Laboratory, Tennessee, USA

3D Nano-printing using Focused Electron Beam Induced Deposition
 
10:50

Coffee break
11:10
Amalio Fernández-Pacheco
, EPSRC Early Career Fellow at the Materials and Condensed Matter Physics group,
School of Physics & Astronomy, University of Glasgow, UK

Synthesis of advanced nanomagnetic systems using Focused Electron Beam Induced Deposition
11:40
Howard Fairbrother
, Professor of Chemistry at Johns Hopkins University, Baltimore, USA

Electron and Ion Induced Surface Reactions with Organometallic Precursors
12:10
Anne Lafosse,
Institut des Sciences Moléculaires d’Orsay (ISMO), CNRS,
Univ Paris-Sud, Université Paris-Saclay, Orsay, France

Tuning the properties of molecular organic layers at the micron-scale using low-energy electrons
 12:40

 
Lunch

Lectures II [EUV]
13:55
I. Pollentier, R. Fallica, A. Rathore, J. S. Petersen, D. De Simone
, imec, Leuven, Belgium

Measurements for understanding the EUV photoresist reactions
14:15
a,b
I. Bespalov, a,c S. Castellanos, b J. Jobst, b,d R. M. Tromp, a,c Y. Zhang,

a,c A. M. Brouwer, b S. J. van der Molen
a Advanced Research Center for Nanolithography, Amsterdam, The Netherlands
b Leiden University, Huygens-Kamerlingh Onnes Laboratory, Leiden, The Netherlands
c University of Amsterdam, van‘t Hoff Institute for Molecular Sciences, Amsterdam, The Netherlands
d IBM T.J. Watson Research Center,Yorktown Heights, New York 10598, USA

Low-Energy electrons in Organometallic EUV resist
14:35
Satinder K. Sharma1 M.G. Moinuddin1, Shivani Sharma1, M. Yogesh2, Rudra Kumar1 and Kenneth E. Gonsalves2

1 School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India
2 School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India

Advancement Towards Sub-15 nm Resists Patterning for
High Volume Manufacturing of Semiconductor Industry
 
10:50

Coffee break
15:15
a
L.-T. Tseng, a D. Kazazis, b P. Constantinou, c T. Stock, c N. Curson, b S. Schofield,

a,d,e G. Aeppli and a Y. Ekinci
a Paul Scherrer Institute, 5232 Villigen PSI, Switzerland
b Dept. of Physics and Astronomy, University College London, London, UK
c London Centre for Nanotech., University College London, London, UK
d Laboratory for Solid State Physics, ETH Zurich, Switzerland
e Institut de Physique, EPFL, Lausanne, Switzerland

Large-area resistless patterning on hydrogen-terminated Si using EUV lithography
Lectures III [FEBIP]
15:35
a C. R. Brewer, a J.-C. Yu, b,c R. M. Thorman, d J. Jurczyk, b D. H. Fairbrother, c O. Ingólfsson,
d I. Utke, a+ L. McElwee-White

a Department of Chemistry, University of Florida, Gainesville, Florida, USA
b Department of Chemistry, Johns Hopkins University, Baltimore, Maryland USA
c Science Institute and Department of Chemistry, University of Iceland, Reykjavík, Iceland
d Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures Thun, Switzerland

Precursors for FEBID of Ru
15:55
a+
I. Utke, a,b J. Jurczyk, b Cz. Kapusta

a Empa – Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland
b AGH University of Science and Technology Kraków, Poland

FEBID frequency maps visualizing lateral deposit resolution and surface diffusion
16:15
Closing remarks of second day

19:00 Dinner at "de Hoorn"

 

 

 

 

 

 Friday, September 6th, 2019 

     
 
08:00

Breakfast
 08:30  
Welcome and opening Remarks 

Student session IV [EUV materials]
08:40
N. Thakur
, S. Castellanos, ARCNL, Amsterdam, Netherlands

Zn-based metal resist for EUV lithography
08:55
Ching-Chung Huang1, Christian Gorsche2, Andreas Rohatschek3, Robert Liska2,
and
Jürgen Stampfl1
1 Institute of Materials Science and Technology, Wien, Austria,
2 Institute of Applied Synthetic Chemistry, Division Macromolecular Chemistry, Wien, Austria,
3 Institute of Lightweight Design and Structural Biomechanics, Wien, Austria

Synthesis and Characterizations of Group 4 Metal Oxo Clusters
for EUVL Photoresist Applications
09:10
 N. Sadegh, F. Campi, J. Haitjema, M. van der Geest, P. Kraus, A.M. Brouwer,
S. Castellanos Ortega
ARCNL - Advanced Research Center for Nanolithography, The Netherlands

Soft x-ray absorption spectroscopy of inorganic photoresists 
 09:25
 A. Rathorea, I. Pollentiera, H. Singhc, R. Fallicaa, D. De Simonea, S. De Gendta,b

aIMEC, Kapeldreef 75, 3001 Leuven, Belgium
bKU Leuven Department of Chemistry, Celestijnenlaan 200, 3001 Leuven, Belgium
cCentre for nanoscience and nanotechnology, Panjab University, 160014 Chandigarh, India

Scission mechanism in the main chain scission type polymers for EUV lithography 
Student session V [FEBIP materials]
 09:40
 a
C. Glessi, b,c J. Jurczyk, d A. Mahgoub, d K. Hagen, b I. Utke, a M. Tilset

a Department of Chemistry - University of Oslo, Norway,
b EMPA, Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland,
c Faculty of Physics and Applied Computer Sciences, AGH University of Science and Technology Kraków, Poland,
d Department of Imaging Physics, Delft University of Technology, The Netherlands.

 Synthesis, characterization and investigation of Gold(I) NHC
complexes as FEBID precursors
  09:55
 
a,b J. Jurczyk, a L. Berger, c K. Höflich, e C. Glessi, d K. Madajska, d I. Szymanska,
e M.
Tilset, b Cz. Kapusta, and a+ I. Utke
a Empa – Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland
b AGH University of Science and Technology Kraków, Poland
c Helmholtz-Zentrum Berlin fur Materialien und Energie, Berlin, Germany
d Nicolaus Copernicus University, Toruń, Poland
e University of Oslo, Oslo, Norway

Carboxylates as promising group of silver FEBID precursors 
 
10:10

Coffee break
 10:30
 a E. Bilgilisoy, a C. Preischl, b R. Thorman, b D.H. Fairbrother, a H. Marbach
a Physikalische Chemie II, FAU Erlangen-Nürnberg, Erlangen, Germany
b Department of Chemistry, Johns Hopkins University, Baltimore, Maryland, United States.

 FEBIP on novel oxide surfaces and electron/ion induced surface reactions of Fe(CO)5
10:45
a
Maria Pintea, a,bNigel Mason and cPablo de Vera

a School of Physical Sciences, University of Kent, Canterbury, UK
b School of Physical Sciences, The Open University, Milton Keynes, UK
c MBN Research Center, Frankfurt, Germany

Complex Molecular System Dynamics in Fe(CO)5 for FEBIP Applications
[invited] The needs from the Industry
11:00
James Blackwell
, Components Research, Intel Corporation, USA

Simplifying the Complex: Mechanism-informed design of EUV photoresists to
control chemical variation in patterning
11:25
Ulrich Welling
, Synopsys GmbH, Germany

Material Modeling for Computational Lithography – the delicate balance of precision,
predictability and computational speed
11:50
Ofer Adan
, AMAT

Enabling e-beam patterning control for <5nm scaling
12:15
Hajme Furutani
, FUJIFILM Electronic Materials, Japan

Challenges of EUV resist development for 3nm node and beyond
 12:40

 
Lunch

Lectures from the Industry
13:40
a
T. Gädda, a N.D. Luong, a M. Laukkanen, a K. Karaste, a O. Kähkönen,
b D. Kazazis, b Y. Ekinci, and a J. Rantala

a PiBond Oy, Finland
b Paul Scherrer Institute, Switzerland

Silicon-rich EUV negative tone resist and underlayer approaches exhibiting
sub-20nm half-pitch resolution
14:00
a
J. G. Santaclara, a G. Rispens, a R. Hoefnagels, a J. van Bree, b P. De Schepper

a ASML, The Netherlands
b Inpria Corporation, OR, USA

Unravelling Inpria metal oxide resist for high-NA imaging
14:20
Best Student Oral Presentation Award

14:30
Closing remarks and Adjourn

 
End of the 2nd ELENA Conference