PROGRAM

The program of the conference is built around invited, contributed talks and poster presentations.

Below, the updated program of the 2019 ELENA Conference.

Wednesday, September 4th, 2019

08:00	Badge pick-up and breakfast
ELENA Project introduction
09:00	Welcome and opening Remarks
09:15	Oddur Ingolfsson, Professor, Department of Chemistry, Science Institute University of Iceland	ELENA: a Marie Skłodowska-Curie Innovative Training Network
Keynote I [device scaling and EUVL]
09:30	Nadine Collaert, Program Director at IMEC, Belgium	CMOS scaling is dead...long live scaling!
10:10	Sander Wuister, Sr. Manager at ASML Research, the Netherlands	EUV lithography performance for manufacturing: status and outlook
10:50	Coffee break
Invited I [fundamentals on electron-induced chemistry]
11:10	Juraj Fedor, Deputy Head of Dynamics of Molecules and Clusters dept., J. Heyrovsky Institute of Physical Chemistry, Czech Academy of Sciences, Prague, Czech Republic	Insight into electron-induced chemistry in FEBID and in EUVL from experiments with clusters
11:40	Takahiro Kozawa, Professor at the Institute of Scientific and Industrial Research, Osaka University, Japan	Radiation chemistry in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography
12:10	Lunch
13:25	Frank Ogletree, Staff Scientist at Molecular Foundry, Berkeley Lab, Berkeley, CA USA	Contrasting electron-induced reactions in Extreme UV and Electron Beam Lithography: Insights from experiment and theory
13:55	Wolfgang Werner, Professor at the Institute of Applied Physics, Vienna University of Technology, Austria	Interaction of Low Energy Electrons with PMMA: determination of fundamental parameters and role of plasmon excitation/decay
Student session I [e-beam and Metal Oxide Framework]
14:25	R.Cartaya, K. Ahlenhoff, M. Rohdenburg, P. Swiderek University of Bremen, Faculty 2 (Chemistry/Biology), Institute of Applied Physical Chemistry, Bremen, Germany	Electron-Beam induced solubility switching in Surface Anchored Metal-Organic Frameworks
14:40	Min Tu, Rob Ameloot cMACS-Centre for Membrane Separations, Adsorption, Catalysis and Spectroscopy for Sustainable Solutions, KU Leuven, Leuven, Belgium	Patterning nanoporous metal-organic framework thin films in nanoscale via e-beam lithography
Student session II [FEBIP 3D]
14:55	A. Mahgoub, C.W. Hagen, Department of Imaging Physics, Delft University of Technology, Delft, The Netherlands	Towards Efficient Direct Write of 3D Structures Using Electron Beam Induced Deposition
15:10	D. Markó^a+, G. Goupil^b, P. Le Gal^b, J. Jiruše^a ^aTESCAN Brno s.r.o., Brno, Czech Republic, ^bOrsay Physics, TESCAN Orsay, Fuveau, France	Novel Results for 3D Nanostructures deposited by FEBID
15:25	Coffee break
Student session III [FEBIP modeling]
15:45	Abid Ali and Hannes Jónsson Science Institute, University of Iceland, Reykjavik, Iceland	Modelling of metal nanostructure growth
Lectures I [EUV]
16:00	T. Watanabe and T. Harada, Hyogo University, Japan [invited]	Fundamental Studies of EUV Resist at the NewSUBARU Synchrotron Light Source
16:30	Peter M. Kraus, Advanced Research Center for Nanolithography, The Netherlands	Unraveling the kinetics of secondary-electron induced reactions by extreme ultraviolet spectroscopy with high-harmonic sources
16:50	John Petersen and Paul van der Heide, imec, Leuven, Belgium	Introduction to imec’s AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
17:10	Closing remarks of 1st day and poster session opening
Poster session
17:15 18:45	Y. Vos, C.W. Hagen, J.P. Hoogenboom Imaging Physics, TU Delft, Delft, the Netherlands	Visualizing few eV electron matter interactions
	J. H. Bredehöft, F. Schmidt, E. Böhler, T. Borrmann, P. Swiderek University of Bremen, Institute for Applied and Physical Chemistry, Bremen, Germany	CO: Volatile ligand or feedstock for impurities?
	L. Wu, S. Castellanos Advanced Research Center for Nanolithography, Amsterdam, The Netherlands	Fluorinated Metal oxo Cluster For EUV Patterning
	F. Schmidt, J. H. Bredehöft, P. Swiderek University of Bremen, Institute for Applied and Physical Chemistry, Bremen, Germany	Electron-Induced Reactions of Olefins with Different Process Gases
	^a S. W. Cendron, ^a G. K. Belmonte, ^b G. P. Reddy, ^c M. G. Moinuddin, ^c J. Peter, ^a C. A. S. Moura, ^a G. Lando, ^b S. K. Sharma, ^c K. E. Gonsalves,^a D. E. Weibel ^a Institute of Chemistry, Universidade Federal do Rio Grande do Sul-UFRGS, Porto Alegre, RS, Brazil. ^b School of Basic Sciences, Indian Institute of Technology Mandi, Mandi, Himachal Pradesh, India. ^c School of Computing and Electrical Engineering, Indian Institute of Technology Mandi, Himachal Pradesh, India.	Photo-dynamic Study of Tin Based Hybrid n-CAR Resist for Next Generation EUVL
	^a S. Nannarone, a N. Mahne, ^a A. Giglia, ^a K. Koshmak, ^a L. Pasquali, ^b R. Fallica, ^b D. De Simone ^a CNR-IOM, Trieste, Italy ^b IMEC, Leuven, Belgium	BEAR beamline as a tool for investigation of photo-excited low energy electrons processes in soft organic materials
	P. Martinović , M. Rohdenburg, P. Swiderek Institute for Applied and Physical Chemistry, Department 2 (Biology/Chemistry), University of Bremen, Germany	Rational design of carboxylate precursors for deposition of pure silver by FEBID: Role of the alkyl chain
	^a+ A. Kamali, ^b W. Carden, ^c E. Bilgilisoy, ^d T. Gentner, ^b L. McElwee-White, ^d S. Harder, ^c H. Marbach, ^a O. Ingólfsson ^a Department of Chemistry and Science Institute - University of Iceland, Reykjavik, Iceland ^b Department of Chemistry - University of Florida, Florida, United States ^c Physical Chemistry II, FAU Erlangen-Nürnberg, Erlangen, Germany. ^d Department of Chemistry – FAU Erlangen-Nürnberg, Erlangen, Germany	An investigation on the low energy electron-induced decomposition of potential gold (I) and (III) containing precursors for FEBID technique
	P. Y. Shih, Ch. F. Hermanns, J. Oster and K.Edinger Carl Zeiss SMT GmbH - ZEISS Group, Rossdorf, Germany	Optical analysis of Focused Electron Beam Induced Depositions on photo masks
	^a R. Fallica, ^b S, J, Rezvani, ^b S. Nannarone, ^c S. Borisov, ^a D. De Simone, ^c S. Babin, ^a G, Lorusso, ^a G. Vandenberghe ^a IMEC, Leuven, Belgium ^b CNR-IOM synchrotron beamline BEAR, Elettra, Trieste, Italy ^c aBeam Technologies Inc., Hayward CA, USA	The hidden tail of low energy electrons in extreme ultraviolet lithography
	^a M. Rohdenburg, ^a P. Martinović , ^a H. Boeckers, ^b C.R. Brewer, ^b L. McElwee-White, ^a P. Swiderek ^a Institute for Applied and Physical Chemistry, Department 2 (Biology/Chemistry), University of Bremen, Germany ^b Department of Chemistry, University of Florida, Gainesville, Florida, U.S.	Exploiting the electron-induced chemistry of NH3 for FEBIP: Applications as precursor ligand and purification agent
	G. Jeevanandam, R. van Tol, Y. van Goozen, P. Kruit and C.W.Hagen Delft University of Technology, Dept. Imaging Physics, Charged Particle Optics group, Delft, The Netherlands.	“Cleanroom” in SEM
	^a R. Tafrishi,^b J. Malletroit, ^b C. Dablemont, ^b L. Amiaud, ^b A. Lafosse, ^a O. Ingólfsson ^a Department of Chemistry, Science institute, University of Iceland, Reykjavik, Iceland ^b Institut des Sciences Moléculaires d’Orsay (ISMO), CNRS, Univ Paris Sud, Université, Paris-Saclay, Orsay, France	Low Energy Electrons in Dissociation of TFMAA as a monomer in EUVL technique: gas phase and surface study
	H. L. Le, Y. Yang, M. Westphal, N. Biere, D. Anselmetti and A. Gölzhäuser Faculty of Physics, Bielefeld University, Germany	Terphenylthiol carbon nanomembranes on silver substrates
	M. G. Moinuddin¹, P. G. Reddy², Satinder K. Sharma¹, S. Ghosh², C. P. Pradeep², and K. E. Gonsalves² ¹ School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India ² School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India	Evaluation of Tin (Sn) Hybrid Non-Chemically Amplified Resist (n-CAR) for Advanced Nanoscale Patterning
	M.G. Moinuddin¹, Manoj Sahani¹, Shivani Sharma¹, M. Yogesh², Satinder K. Sharma¹, Subrata Ghosh², Chullikkattil P. Pradeep and Kenneth E. Gonsalves² ¹ School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India ² School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India	Enhanced photosensitivity of novel photoresist embedded with metallic nanoparticles for Next-generation lithography
	Rudra Kumar¹, M.G. Moinuddin¹, Manvendra Chauhan¹, Jerome Peter¹, Satinder K. Sharma1 and Kenneth E. Gonsalves² ¹ School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India ² School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India	Facile Synthesis of Nickel Metal Organic Cluster Photoresist for sub-10 nm node Lithography
	C. Popescu ^a,b,f, A. McClelland ^a, G. O’Callaghan ^a,b, Y. Vesters ^c,d, J. Roth ^e, W. Theis^f, A.P.G. Robinson ^a,b ^a Irresistible Materials, Birmingham, United Kingdom ^b School of Chemical Engineering, University of Birmingham, United Kingdom ^c IMEC, Leuven, Belgium ^d KU Leuven, Chemistry Department, Leuven, Belgim ^e Nano-C, Westwood, MA, USA ^f School of Physics and Astronomy, University of Birmingham, United Kingdom	Multi-Trigger Resist for EUV Lithography

Thursday, September 5th, 2019
08:00	Badge pick-up and breakfast
09:00	Welcome and opening Remarks
Keynote II [FEBIP and EUV mask repair]
09:10	Daniel Rhinow, Professor, Scientist at Carl Zeiss SMT GmbH, Germany	Focused electron beam-induced processing and its application to photomask repair
Invited II [fundamentals on electron-induced chemistry]
09:50	Ilya Fabrikant, Professor at Physics & Astronomy Dept., University of Nebraska-Lincoln, USA	Electron attachment to molecules in condensed-matter and cluster environments
10:20	Jason Davidson Fowlkes, Staff Scientist at Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Tennessee, USA	3D Nano-printing using Focused Electron Beam Induced Deposition
10:50	Coffee break
11:10	Amalio Fernández-Pacheco, EPSRC Early Career Fellow at the Materials and Condensed Matter Physics group, School of Physics & Astronomy, University of Glasgow, UK	Synthesis of advanced nanomagnetic systems using Focused Electron Beam Induced Deposition
11:40	Howard Fairbrother, Professor of Chemistry at Johns Hopkins University, Baltimore, USA	Electron and Ion Induced Surface Reactions with Organometallic Precursors
12:10	Anne Lafosse, Institut des Sciences Moléculaires d’Orsay (ISMO), CNRS, Univ Paris-Sud, Université Paris-Saclay, Orsay, France	Tuning the properties of molecular organic layers at the micron-scale using low-energy electrons
12:40	Lunch
Lectures II [EUV]
13:55	I. Pollentier, R. Fallica, A. Rathore, J. S. Petersen, D. De Simone, imec, Leuven, Belgium	Measurements for understanding the EUV photoresist reactions
14:15	^a,b I. Bespalov,^a,c S. Castellanos, ^b J. Jobst, ^b,d R. M. Tromp, ^a,c Y. Zhang, ^a,c A. M. Brouwer, ^b S. J. van der Molen ^a Advanced Research Center for Nanolithography, Amsterdam, The Netherlands ^b Leiden University, Huygens-Kamerlingh Onnes Laboratory, Leiden, The Netherlands ^c University of Amsterdam, van‘t Hoff Institute for Molecular Sciences, Amsterdam, The Netherlands ^d IBM T.J. Watson Research Center,Yorktown Heights, New York 10598, USA	Low-Energy electrons in Organometallic EUV resist
14:35	Satinder K. Sharma¹ M.G. Moinuddin¹, Shivani Sharma¹, M. Yogesh², Rudra Kumar¹ and Kenneth E. Gonsalves² ¹ School of Computing and Electrical Engineering (SCEE), Indian Institute of Technology (IIT)-Mandi, India ² School of Basic Science (SBS), Indian Institute of Technology (IIT)-Mandi, India	Advancement Towards Sub-15 nm Resists Patterning for High Volume Manufacturing of Semiconductor Industry
10:50	Coffee break
15:15	^a L.-T. Tseng, a D. Kazazis, ^b P. Constantinou, ^c T. Stock, ^c N. Curson, ^b S. Schofield, ^a,d,e G. Aeppli and ^a Y. Ekinci ^a Paul Scherrer Institute, 5232 Villigen PSI, Switzerland ^b Dept. of Physics and Astronomy, University College London, London, UK ^c London Centre for Nanotech., University College London, London, UK ^d Laboratory for Solid State Physics, ETH Zurich, Switzerland ^e Institut de Physique, EPFL, Lausanne, Switzerland	Large-area resistless patterning on hydrogen-terminated Si using EUV lithography
Lectures III [FEBIP]
15:35	^a C. R. Brewer, ^a J.-C. Yu, ^b,c R. M. Thorman, ^d J. Jurczyk, ^b D. H. Fairbrother, ^c O. Ingólfsson, ^d I. Utke, ^a+ L. McElwee-White ^a Department of Chemistry, University of Florida, Gainesville, Florida, USA ^b Department of Chemistry, Johns Hopkins University, Baltimore, Maryland USA ^c Science Institute and Department of Chemistry, University of Iceland, Reykjavík, Iceland ^d Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Mechanics of Materials and Nanostructures Thun, Switzerland	Precursors for FEBID of Ru
15:55	^a+ I. Utke, ^a,b J. Jurczyk, ^b Cz. Kapusta ^a Empa – Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland ^b AGH University of Science and Technology Kraków, Poland	FEBID frequency maps visualizing lateral deposit resolution and surface diffusion
16:15	Closing remarks of second day
19:00	Dinner at "de Hoorn"

Friday, September 6th, 2019

08:00	Breakfast
08:30	Welcome and opening Remarks
Student session IV [EUV materials]
08:40	N. Thakur, S. Castellanos, ARCNL, Amsterdam, Netherlands	Zn-based metal resist for EUV lithography
08:55	Ching-Chung Huang¹, Christian Gorsche², Andreas Rohatschek³, Robert Liska², and Jürgen Stampfl¹ ¹ Institute of Materials Science and Technology, Wien, Austria, ² Institute of Applied Synthetic Chemistry, Division Macromolecular Chemistry, Wien, Austria, ³ Institute of Lightweight Design and Structural Biomechanics, Wien, Austria	Synthesis and Characterizations of Group 4 Metal Oxo Clusters for EUVL Photoresist Applications
09:10	N. Sadegh, F. Campi, J. Haitjema, M. van der Geest, P. Kraus, A.M. Brouwer, S. Castellanos Ortega ARCNL - Advanced Research Center for Nanolithography, The Netherlands	Soft x-ray absorption spectroscopy of inorganic photoresists
09:25	A. Rathore^a, I. Pollentier^a, H. Singh^c, R. Fallica^a, D. De Simone^a, S. De Gendt^a,b ^aIMEC, Kapeldreef 75, 3001 Leuven, Belgium ^bKU Leuven Department of Chemistry, Celestijnenlaan 200, 3001 Leuven, Belgium ^cCentre for nanoscience and nanotechnology, Panjab University, 160014 Chandigarh, India	Scission mechanism in the main chain scission type polymers for EUV lithography
Student session V [FEBIP materials]
09:40	^a C. Glessi, ^b,c J. Jurczyk, ^d A. Mahgoub, ^d K. Hagen, ^b I. Utke, ^a M. Tilset ^a Department of Chemistry - University of Oslo, Norway, ^b EMPA, Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland, ^c Faculty of Physics and Applied Computer Sciences, AGH University of Science and Technology Kraków, Poland, d Department of Imaging Physics, Delft University of Technology, The Netherlands.	Synthesis, characterization and investigation of Gold(I) NHC complexes as FEBID precursors
09:55	^a,b J. Jurczyk, ^a L. Berger, ^c K. Höflich, ^e C. Glessi, ^d K. Madajska, ^d I. Szymanska, ^e M. Tilset, ^b Cz. Kapusta, and ^a+ I. Utke ^a Empa – Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland ^b AGH University of Science and Technology Kraków, Poland ^c Helmholtz-Zentrum Berlin fur Materialien und Energie, Berlin, Germany ^d Nicolaus Copernicus University, Toruń, Poland ^e University of Oslo, Oslo, Norway	Carboxylates as promising group of silver FEBID precursors
10:10	Coffee break
10:30	^a E. Bilgilisoy, ^a C. Preischl, ^b R. Thorman, ^b D.H. Fairbrother, ^a H. Marbach ^a Physikalische Chemie II, FAU Erlangen-Nürnberg, Erlangen, Germany ^b Department of Chemistry, Johns Hopkins University, Baltimore, Maryland, United States.	FEBIP on novel oxide surfaces and electron/ion induced surface reactions of Fe(CO)5
10:45	^a Maria Pintea, ^a,bNigel Mason and ^cPablo de Vera ^a School of Physical Sciences, University of Kent, Canterbury, UK ^b School of Physical Sciences, The Open University, Milton Keynes, UK ^c MBN Research Center, Frankfurt, Germany	Complex Molecular System Dynamics in Fe(CO)5 for FEBIP Applications
[invited] The needs from the Industry
11:00	James Blackwell, Components Research, Intel Corporation, USA	Simplifying the Complex: Mechanism-informed design of EUV photoresists to control chemical variation in patterning
11:25	Ulrich Welling, Synopsys GmbH, Germany	Material Modeling for Computational Lithography – the delicate balance of precision, predictability and computational speed
11:50	Ofer Adan, AMAT	Enabling e-beam patterning control for <5nm scaling
12:15	Hajme Furutani, FUJIFILM Electronic Materials, Japan	Challenges of EUV resist development for 3nm node and beyond
12:40	Lunch
Lectures from the Industry
13:40	^a T. Gädda, ^a N.D. Luong, ^a M. Laukkanen, ^a K. Karaste, ^a O. Kähkönen, ^b D. Kazazis, ^b Y. Ekinci, and ^a J. Rantala ^a PiBond Oy, Finland ^b Paul Scherrer Institute, Switzerland	Silicon-rich EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution
14:00	^a J. G. Santaclara, ^a G. Rispens, ^a R. Hoefnagels, ^a J. van Bree,^b P. De Schepper ^a ASML, The Netherlands ^b Inpria Corporation, OR, USA	Unravelling Inpria metal oxide resist for high-NA imaging
14:20	Best Student Oral Presentation Award
14:30	Closing remarks and Adjourn
End of the 2nd ELENA Conference